CENTRIA New Director of R&D

CENTRIA, an industry leader in the design, development and manufacture of architectural metal wall and roof systems, is pleased to announce the promotion of Mark Klos, Manager of Research & Development, to the position of Director of Research & Development.

Klos will continue his successful efforts overseeing the development of new and improved products and integrated components for CENTRIA Architectural Systems, overseeing engineering and research operations at the company’s state-of-the-art Product Innovation Center (PIC) in Leetsdale, Pa.

“Research and development is vital to CENTRIA’s position as one of the industry’s preeminent innovators and thought leaders,” said Vice President of Marketing Laura Phelan, NCI Building Systems, Inc. “Mark Klos is the ideal candidate to direct those efforts as we continue to reimagine metal as the future of the building envelope.”

A veteran CENTRIA team member specializing in product innovation, Mark’s experience with CENTRIA spans over 23 years. He joined predecessor H.H. Robertson in 1994 prior to the merger that launched CENTRIA. Mark is a graduate of the University of Pittsburgh with a Bachelor’s degree in Mechanical Engineering.

CENTRIA innovations in architectural metal wall and roof systems are helping building teams around the world reimagine the building envelope. From inspiration through installation, CENTRIA provides the highest level of expertise including service and support from an elite Dealer Network. Based in Pittsburgh (Moon Township, Pa.), our metal architectural systems are the perfect combination of science and aesthetics, offering advanced thermal and moisture protection, the broadest spectrum of design options, truly integrated components, and superior sustainability. CENTRIA is an NCI Building Systems (NYSE:NCS) company. We invite you to explore the limitless possibilities metal provides for your next project and to reimagine metal at CENTRIAPerformance.com or like us on Facebook, subscribe to our YouTube channel, and follow us on Twitter, Pinterest or Instagram.

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